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1. Identificação
Tipo de ReferênciaArtigo em Revista Científica (Journal Article)
Sitemtc-m16.sid.inpe.br
Código do Detentorisadg {BR SPINPE} ibi 8JMKD3MGPCW/3DT298S
Identificador6qtX3pFwXQZsFDuKxG/GEA34
Repositóriosid.inpe.br/marciana/2005/07.05.12.06   (acesso restrito)
Última Atualização2005:07.05.03.00.00 (UTC) administrator
Repositório de Metadadossid.inpe.br/marciana/2005/07.05.12.07
Última Atualização dos Metadados2018:06.05.01.16.46 (UTC) administrator
Chave SecundáriaINPE-12856-PRE/8146
ISSN0925-9635
Chave de CitaçãoFerreiraAzBeAmAlOlSi:2005:NaFiGr
TítuloNanodiamond films growth on porous silicon substrates for electrochemical applications
Ano2005
MêsMar-Jul
Data de Acesso28 abr. 2024
Tipo SecundárioPRE PI
Número de Arquivos1
Tamanho742 KiB
2. Contextualização
Autor1 Ferreira, Neidenei Gomes
2 Azevedo, Adriana Faria
3 Beloto, Antonio Fernando
4 Amaral, M.
5 Almeida, F. A.
6 Oliveira, F. J.
7 Silva, R. F.
Identificador de Curriculo1 8JMKD3MGP5W/3C9JHU3
2
3 8JMKD3MGP5W/3C9JGJ8
Grupo1 LAS-INPE-MCT-BR
Afiliação1 Instituto Nacional de Pesquisas Espaciais, Laboratorio Associado de Sensores e Materiais (INPE, LAS)
2 Univ Aveiro, Dept Engn Ceram & Vidro, Aveiro, P-3800 Portugal
RevistaDiamond and Related Materials
Volume14
Número3-7
Páginas441-445
Histórico (UTC)2005-07-05 12:07:00 :: sergio -> administrator ::
2006-09-28 22:31:40 :: administrator -> sergio ::
2008-01-07 12:54:03 :: sergio -> administrator ::
2018-06-05 01:16:46 :: administrator -> marciana :: 2005
3. Conteúdo e estrutura
É a matriz ou uma cópia?é a matriz
Estágio do Conteúdoconcluido
Transferível1
Tipo do ConteúdoExternal Contribution
Palavras-Chavenanocrystalline diamond
porous electrode
cyclic voltammetry / DOPED DIAMOND ELECTRODES
CHEMICAL-VAPOR-DEPOSITION
CARBON-FIBER CLOTHS
POLYCRYSTALLINE DIAMOND
EFFICIENCY
MECHANISM
OXIDATION
ResumoNanocrystalline diamond (NCD) films were successfully grown on micrometric porous silicon (PS) substrate in a hot filament chemical vapor deposition (HFCVD) reactor. The films were deposited at substrate temperature of 920 K and 6.5 kPa, after seeding pretreatment. The gas flow rate was set in a 50 seem for Ar-CH4-H-2 Mixture. PS substrates were produced by anodic etching using n-type silicon wafers. The morphology, quality and electrochemical response of NCD have been analyzed by scanning electron microscopy (SEM), Raman scattering spectroscopy and cyclic voltammetry (CV) measurements. SEM images have shown faceted nanograins with average size from 30 to 50 nm and uniform surface texture covering all the supports among the pores resulting in an apparent micro honeycomb structure. Raman spectra have exhibited a shoulder at 1550 cm(-1) that is NCD characteristic and have confirmed the good quality films with diamond purity around 90%. Electrochemical response and capacitance behavior of NCD/PS electrodes immersed in aqueous electrolyte solution without redox-active reagents has been explored. The work potential window remains large for NCD, in a similar way of boron doped diamond (BDD), but with a large capacitive background current compared to BDD. NCD/PS presented capacitance values from 230 to 990 mu F cm(-2), while such capacitance values for BDD were between 20 and 40 mu F cm(-2) in the potential range of -0.5 up to 1.0 V x Ag/AgCl. (c) 2005 Elsevier B.V. All rights reserved. .
ÁreaFISMAT
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Conteúdo da Pasta sourcenão têm arquivos
Conteúdo da Pasta agreementnão têm arquivos
4. Condições de acesso e uso
Idiomaen
Arquivo Alvonanodiamond films.pdf
Grupo de Usuáriosadministrator
sergio
Visibilidadeshown
Detentor da CópiaSID/SCD
Política de Arquivamentodenypublisher denyfinaldraft24
Permissão de Leituradeny from all and allow from 150.163
5. Fontes relacionadas
Unidades Imediatamente Superiores8JMKD3MGPCW/3ESR3H2
DivulgaçãoWEBSCI; PORTALCAPES; COMPENDEX.
Acervo Hospedeirosid.inpe.br/banon/2003/08.15.17.40
6. Notas
Campos Vaziosalternatejournal archivist callnumber copyright creatorhistory descriptionlevel documentstage doi e-mailaddress electronicmailaddress format isbn label lineage mark mirrorrepository nextedition notes orcid parameterlist parentrepositories previousedition previouslowerunit progress project readergroup rightsholder schedulinginformation secondarydate secondarymark session shorttitle sponsor subject tertiarymark tertiarytype typeofwork url versiontype
7. Controle da descrição
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