%0 Journal Article
%@holdercode {isadg {BR SPINPE} ibi 8JMKD3MGPCW/3DT298S}
%@nexthigherunit 8JMKD3MGPCW/3ESR3H2 8JMKD3MGPCW/3ET2RFS 8JMKD3MGPCW/3ET38CH
%@resumeid 8JMKD3MGP5W/3C9JHSB
%@resumeid
%@resumeid 8JMKD3MGP5W/3C9JHJ5
%@resumeid
%@resumeid 8JMKD3MGP5W/3C9JH5D
%@resumeid 8JMKD3MGP5W/3C9JGJ8
%@resumeid 8JMKD3MGP5W/3C9JGUH
%@archivingpolicy denypublisher denyfinaldraft24
%@usergroup administrator
%@usergroup vinicius
%3 50.pdf
%B Surface and Coatings Technology
%@dissemination WEBSCI; PORTALCAPES.
%2 sid.inpe.br/iris@1916/2006/03.06.12.13.04
%4 sid.inpe.br/iris@1916/2006/03.06.12.13
%X Historical perspective of the development of PIII devices at the Institute Nacional de Pesquisas Espaciais (INPE) is given, together with the description of the present system under operation and our overall results on this three-dimensional implantation research. Starting with an ignitron switched pulser (1 pulse per 3 min) and an intermittent microwave plasma, we improved our PIII system developing a pulse forming network (PFN) based pulser (20 Hz), 2 years later. We also improved our plasma source towards a DC, highly stable, medium density glow discharge system. A much faster hard tube pulser was recently incorporated to our PIII system (670 Hz) allowing us to achieve good implantation results in different materials. Presently, we are testing a recently purchased RUP-4 commercial pulser to obtain are prevented, 1.1 kHz, square pulses for new experiments in this active field of PIII research. (C) 2001 Elsevier Science B.V. AU rights reserved.
%8 Feb
%N 1-3
%T Plasma immersion ion implantation experiments at the Instituto Nacional de Pesquisas Espaciais
%K plasma immersion ion implantation, surface modification, silicon nitride, iron nitride, high voltage pulse generators / HIGH-VOLTAGE, NITROGEN, SILICON.
%@secondarytype PRE PI
%@group LAP-INPE-MCT-BR
%@group LCP-INPE-MCT-BR
%@group LAS-INPE-MCT-BR
%@copyholder SID/SCD
%@secondarykey INPE-13569-PRE/8779
%@issn 0257-8972
%@affiliation Instituto Nacional de Pesquisas Espaciais, Laboratório Associado de Plasmas, (INPE, LAP),
%P 28-31
%D 2001
%V 136
%A Ueda,  Mario,
%A Berni, Luis Angelo,
%A Rossi, José Osvaldo,
%A Barroso, Joaquim Jose,
%A Gomes,  Geraldo Francisco,
%A Beloto, Antonio Fernando,
%A Abramof,  Eduardo,
%@area FISPLASMA