%0 Journal Article
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%@nexthigherunit 8JMKD3MGPCW/3ESGTTP 8JMKD3MGPCW/3ESR3H2
%@resumeid
%@resumeid
%@resumeid 8JMKD3MGP5W/3C9JHTA
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%@usergroup simone
%3 Numerical simulation of hfcvd process.pdf
%@dissemination WEBSCI; PORTALCAPES; SCIELO.
%2 sid.inpe.br/mtc-m16@80/2006/07.28.19.28.46
%4 sid.inpe.br/mtc-m16@80/2006/07.28.19.28
%X Hot-filament chemical vapour deposition (HFCVD) is a common method employed for diamond deposition. Typically in this method a dilute mixture of carbon containing gas such as methane in hydrogen is thermally activated at sub atmospheric pressures by a hot filament. Due to the filament-substrate proximity, large temperature variation across the substrate is possible. In this work we investigate the role of fluid flow and heat transfer from the filament to substrate in determining the quality of diamond growth. The commercial software CFX was used to calculate velocity field, temperature distribution and fluid flow. A vortex was identified on the substrate.
%8 June
%N 2
%T Numerical simulation of HFCVD process used for diamond growth
%@secondarytype PRE PN
%K Numerical simulation, Diamond growth, Hot-filament chemical vapour deposition.
%@group LAS-INPE-MCT-BR
%@group LAC-INPE-MCT-BR
%@group LAS-INPE-MCT-BR
%@copyholder SID/SCD
%@secondarykey INPE-13915--PRE/9095
%@issn 0103-9733
%@affiliation Instituto Nacional de Pesquisas Espaciais, Laboratório Associado de Sensores e Materiais (INPE.LAS),
%@affiliation Instituto Nacional de Pesquisas Espaciais, Laboratório Associado de Computação e Matemática Aplicada (INPE.LAC),
%@affiliation Instituto Nacional de Pesquisas Espaciais, Laboratório Associado de Sensores e Materiais (INPE.LAS),
%B Brazilian Journal of Physics
%P 313-316
%D 2006
%V 36
%A Barbosa, Divani C.,
%A Nova, Helcio F. V.,
%A Baldan, Maurício Ribeiro,
%@area FISMAT